Products

High Temperature Reactor

"A high-temperature reactor capable of reacting even difficult-to-react substances at high temperatures"

Microwave
High Temperature
Reactor

Key Features of the High-Temperature Microwave Reactor

    1. Superior Efficiency & Speed

  • Direct Heating: Microwaves directly heat the target material, significantly reducing energy consumption.

  • Volumetric Heating: Even ceramic materials with low thermal conductivity can be heated rapidly and uniformly from the core to the surface.

  • Direct Heating: Microwaves directly heat the target material, significantly reducing energy consumption.

  • Ultra-Fast Ramp Rates: Capable of ultra-high-speed heating at rates exceeding $100^\circ\text{C}/\text{min}$, depending on the material.

  • 2. Economic & Operational Benefits

  • Time Savings: Reduces total process time by 50% to 90% compared to conventional heating methods.

  • Energy Conservation: Minimizes heat loss, leading to an energy saving of 20% to 50%.

  • 3. Extreme Temperature Capabilities

  • By mixing materials with high dielectric constants at elevated temperatures (certain ceramics) or using them as susceptors, the reactor can achieve temperatures exceeding 2000℃.

  • 4. Process Versatility

    The system is easily adaptable to various atmospheric and environmental conditions:

  • Vacuum (Reduced Pressure)

  • Pressurized Environments

  • Inert Gas Atmospheres

  • 5. Wide Range of Applications

    This technology is applicable across numerous high-tech industries:

  • Powder Processing: Ultra-fast heating reactions and sintering.

  • Advanced Materials: Nanomaterial manufacturing and synthesis of novel materials.

  • Precision Heat Treatment: Energy-efficient thermal processing.

  • Pyrolysis: High-efficiency thermal decomposition..

Battery cathode
synthesis reactors

Continuous Microwave Synthesis Furnace for Silicon Anode Materials

  • This is an ultra-fast synthesis system designed to composite silicon with graphite, a key material for high-capacity battery cathode.

  • Pure Microwave Energy: Capable of rapid silicon synthesis utilizing 100% microwave energy.

  • Controlled Environment: Operates under vacuum or inert gas atmospheres to ensure material purity and prevent oxidation.

  • Maximum Temperature: 700℃

  • Ultra-fast Ramp Rate: Up to 100℃,min or higher.

  • The system features a fully automated continuous process, covering everything from material loading to the discharge of synthesized raw materials, maximizing production throughput and consistency.

  • Continuous battery cathode material synthesis device

  • Battery cathode material synthesis device

  • Synthetic cathode material

Microwave
High Temperature
Reactor

Batch-Type Microwave Heat Treatment Furnace

  • This system realizes an energy-saving heat treatment solution by leveraging Microwave technology to reduce power consumption compared to traditional resistive heating.

  • Rotary Kiln Configuration: The rotating drum design ensures uniform and rapid heat treatment of powdered battery raw materials by preventing material agglomeration.

  • Maximum Temperature: 1200℃, Ultra-fast Ramp Rate: 80~100℃/min

  • Atmospheric Control: Capable of processing under vacuum or inert gas atmospheres to maintain high material purity.

  • This furnace is optimized for high-performance material manufacturing, including:

  • Battery Raw Materials: Precision heat treatment of cathode/anode precursors.

  • Expanded Graphite: Efficient production of high-surface-area graphite.

  • Carbon Deposition (CVD): Specialized equipment for carbon coating and deposition processes.

  • Rotary type heat treatment furnace

  • Rotary type heat treatment furnace

  • Ferris wheel type heat treatment furnace

Semiconductor
wafer heat
treatment
furnace

Continuous-Type Wafer Heat Treatment Furnace

  • Continuous Processing: Enables uninterrupted heat treatment of semiconductor wafers.

  • Uniform Heating via Susceptor: Utilizes high-performance susceptors to ensure perfectly uniform thermal distribution across the entire wafer surface.

  • Ceramic Roller Conveyor: Features a specialized ceramic roller transport system for stable, continuous movement through the heating zone.

Batch-Type Wafer Heat Treatment Furnace

  • Dual Chamber Configuration: Implements a dual-chamber system to enhance operational efficiency and throughput within a batch framework.

  • Turntable Mechanism: The integration of a bottom-side turntable ensures uniform microwave exposure and consistent heating for every wafer.

  • Advanced Control System: Equipped with real-time temperature control and monitoring for high-precision thermal management.

  • Continuous-Type Wafer Heat Treatment Furnace

  • Continuous-Type Wafer Heat Treatment Furnace

  • Batch-Type Wafer Heat Treatment Furnace

Aluminum
melting
furnace

Aluminum melting furnace

  • Semi-Continuous Aluminum Melting Capabilities

  • Rapid Initial Preheating: Significantly reduces standby time and enables substantial energy savings.

  • Enhanced Energy Efficiency: By integrating Microwave technology, energy consumption can be reduced by more than 20% compared to conventional RF (Radio Frequency) methods.

  • Indirect Heating & Tilting Structure: Can be manufactured with a tilting furnace structure; the indirect heating method minimizes damage to the melting crucible.

  • Semi-Continuous Operation: The lower saddle structure of the furnace allows for the implementation of semi-continuous melting processes.

  • Aluminum melting furnace

  • Aluminum melting furnace simnulation

  • Heating profile